Chemical Vapor Deposition (CVD) is a technology used by the semiconductor industry to deposit materials on wafer surfaces by decomposing gaseous molecules. With CVD, a gas containing a metal or insulator chemistry is combined in a reaction chamber, along with an energy source. The resulting reaction forms a thin film of solid material that is then deposited directly onto the wafer’s surface. 

Wolfe Engineering fully supports this process by providing gas weldments, modules and turnkey integrated systems. Wolfe is considered as an industry expert in providing space and cost-conscious solutions in full compliance with required industry safety specifications.